Pilot Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

Customization: Available
After-sales Service: Engineers Can Be Sent to The Worksite
Warranty: 1 Year

Product Description

Basic Information
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Weight (Kg)
4000
Key Selling Points
Automatic
Technology
Physical Vapor Deposition
Method of Coating
Magnetron Sputtering
Kinds of Film
Functional Coatings
Automatic Grade
Automatic, Manual
Sputtering Source
Hipims, DC, Mf, RF
Product Description

Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System

The equipment features a reasonable structure, providing even coating quality, high pumping speed, short cycles, and high efficiency. It is designed for easy operation with low energy consumption and stable performance. It is widely applied in industries such as automotive, audio, small appliances, computers, watches, toys, mobile phones, and cosmetics.

Sputtering System 1
Sputtering System 2

DC Magnetron Sputtering Coating Machine

This system is typically utilized for direct sputtering coating on various substrates, including plastics, glass, metal, and ceramics. With over 10 years of experience in manufacturing magnetrons (rectangular, cylindrical, circular), we provide solutions that fit most magnetron sizes with direct-cooled or bonded targets.

Coating Process
Technical Specifications
Model Number SP-1000 SP-1200 SP-1400 SP-1800
Vacuum Chamber Size (D*H) 1000*1100 1200*1400 1400*1600 1800*2000
Chamber Material Carbon steel, SUS304 or SUS316L
Sputtering Cathodes ≥1 sets, DC sputtering system, cylindrical or rectangle
Pumping System Turbo molecular or diffusion pump + mechanical pump
Pumping Time Atmosphere to 5.0*10-2Pa < 8 minutes
Ultimate Vacuum 5.0*10-4 Pa
Working Mode Automatic or Manual via 10.4/15 inch PLC touch screen
Total Power 40-100kW 70-1000kW

*All specifications can be customized according to specific requests.

Necessary Components & Accessories

We provide essential parts for daily production requirements:

  • Vacuum pumps
  • DC sputtering cathodes with power supplies
  • Unbalanced sputtering cathodes
  • O-rings
  • Vacuum meters with gauges/sensors
  • Bias power supply
  • Magnetic valves
  • Mass Flow Controllers (MFC)
  • Target materials
  • Customized jigs
Components
Gallery
Facility 1
Facility 2
Facility 3
Frequently Asked Questions
Q1: What materials can be coated using this magnetron sputtering system? A: The system is designed for various substrates including steel, plastics, glass, metal, and ceramic materials.
Q2: Is the equipment fully automatic? A: The equipment features both Automatic and Manual modes, controlled via a PLC touch screen interface for high efficiency.
Q3: Can the vacuum chamber size be customized? A: Yes, the dimension of the vacuum chamber, the quantity of sputtering cathodes, and the pump configurations can all be custom-made.
Q4: How long does the pumping process take? A: The system can reach 5.0*10-2Pa from atmospheric pressure in less than 8 minutes.
Q5: What industries commonly use this thin film deposition technology? A: It is widely used in automotive parts, small appliances, watches, toys, mobile phone components, and functional decorative coatings.
Q6: What types of power sources are supported? A: The system supports HiPIMS, DC, MF, and RF sputtering power sources depending on the application requirements.

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