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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
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CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating
CVD Ald Atomic Layer Deposition System for Powder Coating Plating

CVD Ald Atomic Layer Deposition System for Powder Coating Plating

Customization: Available
After-sales Service: Onlin
Warranty: 1
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Product Description

CVD ALD Atomic Layer Deposition System for Powder Coating Plating

Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. The equipment is widely used in the fields of micro-electronics, nano materials, optical films, solar batteries, etc.

📋 Basic Information
Model NO.
CY-ALD
Type
Coating Production Line
Coating
Vacuum Coating
Certification
CE
Condition
New
Wafer Dimension
8 Inch and Below
Vacuum
<5*10-3torr
Gas System
N2 or Ar
Product Benefits & ALD Films

Advanced Controlling System: Integrated functions including technological formulation, parameter setting, popedom setting, interlocking alarming and state supervisory control.

Elementary: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN Oxide: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2
Application Fields
High-k gate oxides
Storage capacitor dielectrics
High aspect ratio diffusion barriers for Cu interconnects
Pinhole-free passivation layers for OLEDs and polymers
Highly conformal coatings for MEMS applications
Coating of nanoporous structures
Solar battery and Optical thin-film
⚙️ Technical Parameters
Wafer Dimension8 inch and below
Wafer TemperatureRT-400ºC, Precision ±0.1ºC
Precursor LinesThree precursor lines (Optional more)
Line TemperatureRT-200ºC, Precision ±0.1ºC
Source Bottle TempRT-200ºC, Precision ±0.1ºC
ALD ValveSwagelok ALD swift valve
Growing ModeConsecutive or interval deposition mode
Controlling SystemPLC plus touch screen or display
UniformityHeterogeneity < ±1%
Dimensions600mm x 600mm x 1100mm
📷 Detailed Photos
ALD System Photo 1
ALD System Photo 2
ALD System Photo 3
ALD System Photo 4
ALD System Photo 5
ALD System Photo 6
Process Banner
Certification and Quality
❓ Frequently Asked Questions
Are you a manufacturer or a trading company?
We are professional laboratory instrument manufacturers with our own design team and factory, ensuring high quality and optimal pricing.
How is the product after-sales service system?
The warranty period is 12 months with lifetime maintenance. We respond within 24 hours to resolve any technical issues.
How long is the delivery time for customized instruments?
In-stock goods take 5-10 days. Customized instruments usually take 30-60 days depending on the specific requirements.
Can you solve power supply and plug differences?
Yes, we provide transformers and plugs according to your local requirements and national standards.
What are the available payment methods?
We accept T/T, L/C, D/P, and other methods, with Trade Guarantee being highly recommended.
How are the goods packaged for delivery?
We use standard export fumigation wooden box packaging and ship via express, air, or sea based on your preference.

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